This project presents the Photo Diode frabication by Hot Filament CVD at atmosphere. Firstly , silicon (Si) substrate is treated . Then , diamond films in P-type will be grown and analyzed by Raman spectroscopy and SEM (Scanning Electron Microscopy) . Distance from contact which affects the diamond plane is studied . Another studying is to analyze the effect on intensity of light and temperature in Photo Diode . This project presents Photo Diode Fabricate from diamond thin film which tolerate high temperature (1000 – 3000 oC ) and response to high frequency ( 1GHz – 100GHz )
By
Prinya Chakrisana
Atthapon Pomsatitaya
